Focal plane adjusted photomask and methods of projecting...

Details Focal plane adjusted photomask and methods of projecting... Focal plane adjusted photomask and methods of projecting...

H - Electricity

01

L

356/177, 356/192

H01L 21/42 (2006.01) G03F 1/14 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1218763

- 18 - FOCAL PLANE ADJUSTED PHOTOMASK AND METHODS OF PROJECTING IMAGES ONTO PHOTOSENSITIZED WORKPIECE SURFACES ABSTRACT In the operation of a projection printer photomasks, the patterns of which are protected by coverplate, are used interchangeably with other photomasks, the patterns of which are located at an open surface thereof. The photomasks feature shims which space the patterns away from a plane of support surfaces of a mounting chuck by a precise distance equal to the shift of the object plane with respect to an image plane because of the presence of the coverplate in the optical path of the projection printer.

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