Formation of a transparent conductive oxide film for use in...

C - Chemistry – Metallurgy – 25 – D

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Details

C25D 7/08 (2006.01) C25D 9/04 (2006.01) C25D 9/08 (2006.01) C25D 19/00 (2006.01) H01L 31/0336 (2006.01) H01L 31/042 (2006.01) H01L 31/18 (2006.01)

Patent

CA 2732559

The invention relates to the production of a photovoltaic structure that includes a thin coating film, generally made of a transparent conductive oxide, deposited on top of a sublayer having photovoltaic properties. According to the invention, the coating film is deposited electrochemically in an electrolysis bath (1) and at least partly assisted by illumination coming from a light source (2).

L'invention concerne la fabrication d'une structure photovoltaïque comportant une couche mince de revêtement, généralement d'oxyde transparent et conducteur, et déposée au-dessus d'une sous-couche à propriétés photovoltaïques. Au sens de l'invention, le dépôt de la couche de revêtement est réalisé par électrochimie, dans un bain d'électrolyse (1) et assisté au moins en partie par un éclairement issu d'une source de lumière (2).

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