Formation of potassium tantalate niobate thin films by...

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B41M 5/26 (2006.01) C23C 18/12 (2006.01) H01L 37/02 (2006.01)

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CA 2042083

C-4245 FORMATION OF POTASSIUM TANTALATE NIOBATE THIN FILMS BY METALORGANIC DEPOSITION Abstract of the Disclosure Thin films of potassium tantalum niobate, KTa1-xNbxO3, or KTN, material are deposited using the non-vacuum technique of metalorganic deposition. First, a suitable metalorganic precursor dissolved in solution, preferably the carboxylates of potassium, tantalum and niobium in xylene, is dispensed onto a substrate much like photoresist. The substrate, preferably platinum or platinum coated yttria but also foreseeably CaF2, BaF2 or Er2O3, is spun at a few thousand revolutions per minute to remove the excess fluid, driving off the xylene solvent and uniformly coating the substrate surface with a metalorganic film a few microns thick. The soft metalorganic film is then pyrolyzed in an air atmosphere to convert the metalorganic precursors to their constituent oxides, and subsequently annealed to form the perovskite crystal structure throughout the film. Superior films are formed when the metalorganic precursor solution is potassium deficient as compared to stoichiometry, and then subsequently annealed after pyrolysis in a potassium rich environment to form stoichiometric metal oxide films. The resulting films exhibit uniform, high quality physical, chemical and electrical properties throughout, and are suitable for the economical fabrication of an uncooled infrared detector having maximum response characteristics.

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