B - Operations – Transporting – 05 – D
Patent
B - Operations, Transporting
05
D
356/142, 96/256,
B05D 3/06 (2006.01) C08G 18/48 (2006.01) C08G 18/81 (2006.01) G03F 7/038 (2006.01) H01B 3/36 (2006.01) H01B 3/42 (2006.01) A61K 38/00 (2006.01)
Patent
CA 1309056
ABSTRACT OF THE DISCLOSURE A cost-efficient method for producing dimensionally precise and high-grade heat-resistant structured layers by applying a single coating of a radiation-sensitive soluble polyether-based photopolymer in the form of a layer or foil on a substrate; irradiating the layer or foil through a negative with actinic light or by guiding a light, electron, laser, or ion beam; removing the nonirradiated layer or foil portions; and subsequent optional annealing, wherein the photopolymer comprises an addition product of an olefin-unsaturated monoisocyanate and a polyether having at least one hydroxyl group. The layers provided according to the invention can withstand the thermal and mechanical stresses of dip soldering process, and protect circuit surfaces effectively and durably against moisture and corrosion; they are therefore suitable in particular as solder resist and insulating layers in micro-conductor technology.
512150
Ahne Hellmut
Plundrich Winfried
Ahne Hellmut
Aktiengesellschaft Siemens
Fetherstonhaugh & Co.
Plundrich Winfried
LandOfFree
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