Free-form nanofabrication using multi-photon excitation

G - Physics – 03 – F

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G03F 7/20 (2006.01) B82B 3/00 (2006.01) C07K 17/04 (2006.01) C08F 2/46 (2006.01) C08F 20/10 (2006.01) C08F 20/56 (2006.01) C08H 1/00 (2006.01) C08J 3/28 (2006.01) C12N 11/04 (2006.01) G03F 7/00 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2326322

A method and apparatus wherein small, two- or three-dimensional structures are formed by multiple-photon-absorbed photopolymer-ization and/or cross-linking of a precursor composition, that is, photopolymerization using multi-photon excitation. Use of multi-photon excitation allows fabrication of structures and structural features having at least one dimension of less than about 1 micron, preferably less than about 500 nm, more preferably less than about 250 nm, and most preferably of less than about 100 nm, in bulk phase as well as in solution, and from a wide variety of organic and inorganic precursor subunits, including synthetic polymers and biological polymers such as proteins, lipids, oligonucleotides, and the like.

On décrit un procédé et un système dans lequels des structures bidimensionnelles ou tridimensionnelles sont formées par photopolymérisation par absorption multiphotonique et/ou par réticulation d'une composition précurseur, c'est-à-dire une photopolymérisation mettant en oeuvre une excitation multiphotonique. La mise en oeuvre d'une excitation multiphotonique permet de fabriquer, à partir d'un grand nombre de sous-unités précurseurs organiques ou inorganiques (y compris des polymères synthétiques et des polymères biologiques tels que des protéines, des lipides, des oligonucléotides, etc.), des structures et des éléments de structure ayant au moins une dimension inférieure à environ un micron, de préférence inférieure à environ 500 nm, ou mieux, inférieure à environ 250 nm, ou plus idéalement, une dimension inférieure à 100 nm, aussi bien en phase massique qu'en solution.

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