C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/300, 167/9,
C07D 405/06 (2006.01) A01N 43/00 (2006.01) A01N 43/50 (2006.01) A01N 43/653 (2006.01) C07D 213/48 (2006.01) C07D 303/16 (2006.01) C07D 405/04 (2006.01) C07D 405/14 (2006.01) C07D 409/14 (2006.01) C07D 413/14 (2006.01) C07D 417/14 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2024404
O.Z. 0050/41099 ABSTRACT OF THE DISCLOSURE: Azolylmethyloxiranes I Image (A, B = 5-/6-membered hetaryl, alkyl, cycloalkyl, tetrahydropyranyl, tetrahydrothiopyranyl, phenyl, biphenyl, naphthyl or benzyl, the substituents A and B being unsubstituted or bearing up to three further radicals, with the proviso that at least one of the substituents A and B is hetaryl unless B is o-methylphenyl; Z = CH, N) and their acid addition salts and metal complexes, with the exception of 2-(imidazol-1-ylmethyl)-2-(4-fluorophenyl)-3-(pyrid- 3-yl)-oxirane. The compounds I are suitable as fungicides.
Ammermann Eberhard
Gebhardt Joachim
Goetz Norbert
Kober Reiner
Lorenz Gisela
Basf Aktiengesellschaft
Robic
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