Further process for the manufacture of resorcinol ethers

Details Further process for the manufacture of resorcinol ethers Further process for the manufacture of resorcinol ethers

C - Chemistry, Metallurgy

07

D

167/233, 260/312

C07D 257/04 (2006.01) A61K 31/41 (2006.01)

Patent

CA 1265147

Further process for the manufacture of resorcinol ethers Abstract Novel 4-acylresorcinol ethers of the formula Image (I) in which R1 is lower alkyl, alk is a hydroxyalkylene radical which can be interrupted by oxygen and R2 is 5-tetrazolyl,it being possible for the ring A to be additionally substituted by lower alkyl, lower alkenyl, lower alkynyl, lower alkoxy and/or halogen and for the ring B to be additionally substituted by lower alkyl, lower alkanoyl, lower alkoxy, lower alkoxycarbonyl, carboxyl, cyano, carbamyl, halogen and/or trifluoromethyl, and salts thereof have antiallergic properties and can be used as active compounds for medicaments. They are prepared by methods known as per se.

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