C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/02 (2006.01) A61K 31/415 (2006.01) A61K 31/44 (2006.01) A61K 31/495 (2006.01) A61K 31/55 (2006.01) C07D 311/58 (2006.01) C07D 405/06 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2117551
Fused phenol derivatives of the formula (I): Image (wherein R1 and R2 each, independently, is H, halogen, trifluoromethyl, cyano, (substituted) alkyl, alkoxy, cycloalkyl, COOH, COOR6 (in which R6 is C1-6 alkyl), alkenyl or R1 and R2, taken together, is -CH=CH-CH=CH-, when R1 and R2 are attached ortho to each other: A is alkylene, alkenylene, oxyalkylene or Image (in which m is 1-6): B is monocyclic hetero ring containing nitrogen atom: G is -OR3A or -NR3BR3C (in which R3A, R3B and R3C each, independently, is H, alkyl, acyl, or alkoxyalkyl): R4 and R5 each, independently, is H, alkyl, or R4 and R5 together with the carbon atom to which they are attached is C4-7 cycloalkyl; n is 1-3: and non-toxic salts thereof, non-toxic acid addition salts thereof and hydrates thereof, have utility as pharmaceuticals.
Nambu Fumio
Ohuchida Shuichi
Toda Masaaki
Mccarthy Tetrault Llp
Ono Pharmaceutical Co. Ltd.
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