C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
148/3.8
C30B 25/02 (2006.01) C30B 29/42 (2006.01) H01L 21/205 (2006.01) H01L 29/267 (2006.01)
Patent
CA 1265980
Abstract of the Disclosure A GaAs growth crystal comprises a Si substrate, an intermediate layer formed on the substrate and a GaAs layer grown on the intermediate layer. The intermediate layer includes constituent GaP/GaAsP and GaAsP/GaAs superlattice layers and additionally AIP and AlGaP thin films.
491985
Sakai Shiro
Soga Tetsuo
Umeno Masayoshi
Daidotokushiko Kabushikikaisha
Robic Robic & Associes/associates
Umeno Masayoshi
LandOfFree
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