C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 18/72 (2006.01) C08G 18/08 (2006.01) C08G 18/12 (2006.01) C08G 18/32 (2006.01) C08G 18/75 (2006.01) C08G 18/76 (2006.01) C08J 5/18 (2006.01)
Patent
CA 2314574
A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e. g., an aromatic diisocyanate) with a diol component (e.g., a C2-8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics , and others , and a film containing the same.
Shiraki Hiroyuki
Tawa Tsutomu
Uchida Takashi
Fetherstonhaugh & Co.
Mitsui Takeda Chemicals Inc.
Takeda Chemical Industries Ltd.
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