C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
148/2.3
C30B 29/60 (2006.01) C01B 33/035 (2006.01) C30B 25/02 (2006.01) C30B 25/08 (2006.01) C30B 25/10 (2006.01) C30B 25/14 (2006.01) C30B 25/18 (2006.01)
Patent
CA 1178178
C19-21-0285A GAS CURTAIN CONTINUOUS CHEMICAL VAPOR DEPOSITION PRODUCTION OF SEMICONDUCTOR BODIES ABSTRACT OF THE DISCLOSURE Apparatus and process for producing electronic- grade semiconductor bodies are disclosed wherein continu- ously-pulled slim rod which can be formed in situ from the reaction of a seed crystal and a molten semiconductor material source, is pulled into and through a chemical vapor deposition chamber, having a gas curtain along the inner wall, the slim rod surface being preheated before entry into the deposition chamber where it is simultaneously exposed to focused heating and thermally decomposable gaseous compounds in order to provide suitable surface reaction conditions on the slim rod for the decomposition of the gaseous compounds which results in deposition growth upon the surface of the rod. Single crystal semiconductor bodies are produced according to the process by avoiding poly-growth conditions through the in situ continuously pulled virgin slim rod, preheating of the slim rod for entry into the chemical vapor deposition chamber wherein the rod is simultaneously heated or maintained at reaction tempera- ture conditions while being exposed or contacted with selected thermally decomposable gaseous compounds and con- tinuously drawn through the chemical vapor deposition cham- ber reaction zone resulting in an enlarged single crystal semiconductor body which is withdrawn continously from the chemical vapor deposition chamber.
382626
Garavaglia Paul M.
Gutsche Henry W.
Mcfadden Fincham
Solutia Inc.
LandOfFree
Gas curtain continuous chemical vapor deposition production... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas curtain continuous chemical vapor deposition production..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas curtain continuous chemical vapor deposition production... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1302772