Gas discharge derived annular plasma pinch x-ray source

Details Gas discharge derived annular plasma pinch x-ray source Gas discharge derived annular plasma pinch x-ray source

H - Electricity

01

J

356/147, 358/24

H01J 35/00 (2006.01) G03F 7/20 (2006.01) H05G 1/00 (2006.01) H05G 2/00 (2006.01)

Patent

CA 1239486

TITLE GAS DISCHARGE DERIVED ANNULAR PLASMA PINCH X-RAY SOURCE INVENTORS RAJENDRA P. GUPTA MLADEN M. KEKEZ JOHN H. LAU GARY D. LOUGHEED ABSTRACT OF DISCLOSURE This invention describes a pulsed plasma pinch x-ray source. In the device the initial plasma annulus is derived from an electrical gas discharge in a chamber having constricted openings arranged on a circle. This low mass plasma annulus is imploded and pinched by passing high current axially through said annulus. The hot and dense pinched plasma copiously emits x-rays and has the capability of being fired at high repetition rates. The device is simple for commercial applications, such as x-ray lithography.

492226

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