B - Operations – Transporting – 01 – D
Patent
B - Operations, Transporting
01
D
165/52
B01D 47/16 (2006.01) B01D 1/18 (2006.01) F26B 3/12 (2006.01)
Patent
CA 1113375
Abstract of the disclosure: A processing gas is supplied to the atomizing zone around an atomizing device arranged centrally in an atomizing chamber through a conical guide duct communicating with a horizontal spiral supply duct through an annular mouth. A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes arranged with a small angular spacing in the mouth and comprising two succeeding vane sets, in which the vanes of one set are shaped to deflect the tangential gas stream in the spiral duct to a flow direction, for which the radial velocity component con- siderably exceeds the tangential component, whereas each vane of the other set positioned at the opening of the mouth towards the conical guide duct projects into the space between nieghbouring vanes of the first set and extends substantially parallel to tangential planes to said vanes at their internal edges.
333562
Larsson Finn H.
Schwartzbach Christian
A/s Niro Atomizer
Gowling Lafleur Henderson Llp
LandOfFree
Gas distribution device for the supply of a processing gas... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas distribution device for the supply of a processing gas..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas distribution device for the supply of a processing gas... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-6322