Gas distribution ring for plasma gun

H - Electricity – 05 – H

Patent

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32/60, 327/72

H05H 1/34 (2006.01) B05B 7/22 (2006.01) H05H 1/42 (2006.01)

Patent

CA 1271228

LE-3551 ABSTRACT OF THE DISCLOSURE A gas distribution ring for a plasma gun comprises a ring member with two sets of gas inlet orifices extending from the outer surface inwardly through the ring member. The outer surface has an undulated groove for an O-ring formed therein, and the orifices are positioned with respect to the undulated O-ring such that one set of orifices are isolated on one side of the O-ring and the other set of orifices are isolated on the other side of the O-ring. In a preferred embodiment the orifices of one set are radial with respect to the axis of the ring, and the orifices on the other side of the undulated O-ring have a tangential component to provide vortical gas flow in the arc region of the gun, The gas distribution ring positioned in the plasma spray gun permits a simple choice between radial and vortical flow in the arc region of the gun, without alteration of the gun.

535633

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