Gas-flushing base for metallurgical vessels

C - Chemistry – Metallurgy – 21 – C

Patent

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Details

C21C 5/48 (2006.01) B22D 1/00 (2006.01) C22B 9/05 (2006.01) F27D 1/10 (2006.01)

Patent

CA 2245668

The invention concerns a gas-flushing base for metallurgical vessels, the base comprising a monolithic refractory ceramic lining in which ducts are formed by chemical or physical processes. At their ends associated with an adjacent vessel wall, the ducts are designed for direct or indirect fluidic connection to a gas delivery line. At their other ends the ducts lead into the corresponding cover layer of the refractory ceramic lining.

L'invention concerne un fond de rinçage au gaz pour cuves métallurgiques, qui comprend un revêtement intérieur céramique monolithique réfractaire dans lequel sont pratiqués des canaux à l'aide de procédés chimiques ou physiques. A leur extrémité associée à une paroi adjacente de cuve, ces canaux sont conçus de manière à être reliés directement ou indirectement à une conduite d'alimentation en gaz. A leur autre extrémité, lesdits canaux débouchent dans la couche de couverture correspondante du revêtement intérieur céramique réfractaire.

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