C - Chemistry – Metallurgy – 21 – C
Patent
C - Chemistry, Metallurgy
21
C
C21C 5/48 (2006.01) B22D 1/00 (2006.01) C22B 9/05 (2006.01) F27D 1/10 (2006.01)
Patent
CA 2245668
The invention concerns a gas-flushing base for metallurgical vessels, the base comprising a monolithic refractory ceramic lining in which ducts are formed by chemical or physical processes. At their ends associated with an adjacent vessel wall, the ducts are designed for direct or indirect fluidic connection to a gas delivery line. At their other ends the ducts lead into the corresponding cover layer of the refractory ceramic lining.
L'invention concerne un fond de rinçage au gaz pour cuves métallurgiques, qui comprend un revêtement intérieur céramique monolithique réfractaire dans lequel sont pratiqués des canaux à l'aide de procédés chimiques ou physiques. A leur extrémité associée à une paroi adjacente de cuve, ces canaux sont conçus de manière à être reliés directement ou indirectement à une conduite d'alimentation en gaz. A leur autre extrémité, lesdits canaux débouchent dans la couche de couverture correspondante du revêtement intérieur céramique réfractaire.
Dosinger Klaus
Dott Karl-Heinz
Hammerer Walter
Heiligenbrunner Michael
Reiterer Franz
Fisk George E.
Veitsch-Radex Aktiengesellschaft Fur Feuerfeste Erzeugnisse
LandOfFree
Gas-flushing base for metallurgical vessels does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas-flushing base for metallurgical vessels, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas-flushing base for metallurgical vessels will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1530600