C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 3/02 (2006.01) B01J 7/02 (2006.01) B01J 8/00 (2006.01) B01J 8/02 (2006.01) B01J 19/00 (2006.01) C01B 3/00 (2006.01) C01B 3/06 (2006.01) C01B 3/50 (2006.01) F17C 11/00 (2006.01) H01M 8/06 (2006.01) H01M 8/22 (2006.01)
Patent
CA 2435104
A gas generation system includes a chemical reactor configured to produce a gas from a continuous flow of aqueous solution, and includes a pump configured to control the flow of the aqueous solution through the chemical reactor to control a production rate of the gas.
Devos John A.
Hewlett-Packard Development Company L.p.
Sim & Mcburney
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