Gas injection apparatus and method having application to...

C - Chemistry – Metallurgy – 22 – B

Patent

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C22B 3/04 (2006.01) B01F 3/04 (2006.01) B01F 3/08 (2006.01) B01F 5/04 (2006.01) C22B 11/00 (2006.01)

Patent

CA 2183130

A gas injection apparatus for injecting a gas into a liquid comprising a baffle plate, a re-circulation chamber, and a discharge nozzle. The discharge nozzle is oriented normally to the baffle plate so that a liquid stream composed of the liquid is directed against the baffle plate and produces an oppositely directed flow towards the outer peripheral edge of the baffle plate. The oppositely directed flow has a sheet-like turbulent flow regime located adjacent to the plate and a circulating flow regime located above the turbulent flow regime and bounded by a re-circulation chamber. The gas is mixed into the liquid so that smaller bubbles are entrained in the turbulent flow regime and are discharged with the liquid flowing in the turbulent flow regime from the outer peripheral edge of the baffle plate. Larger bubbles flow into the circulating flow regime to break up into smaller bubbles which are entrained in the turbulent flow regime swept out of the apparatus. The apparatus is particularly useful in a gold leaching process in which the gold slurry is thickened to produce clarified water. Oxygen is injected into the clarified water and thereafter, the clarified water is injected into a leaching tank.

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