Gas injector for plasma enhanced chemical vapor deposition

Details Gas injector for plasma enhanced chemical vapor deposition Gas injector for plasma enhanced chemical vapor deposition

C - Chemistry, Metallurgy

23

C

C23C 16/50 (2006.01) C23C 16/54 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2201686

The use of a gas injector including a dielectric material around the ports has an advantage when used with plasma enhanced chemical vapor deposition in that a plasma torch will not be formed at the gas injector and the gases will not dissociate prematurely. This adds to the quality of the coatings and allows the system to be used at higher amperage and thus improved line speeds. The use of a dielectric plug at the ports allows the ports to be easily serviced and replaced.

L'utilisation d'un injecteur de gaz muni d'un matériau diélectrique autour des orifices présente l'avantage suivant : lorsqu'il est employé avec dépôt de vapeur chimique amélioré au plasma, il ne se forme pas de torche à plasma à l'injecteur de gaz et les gaz ne sont pas dissociés prématurément. Cela augmente la qualité des revêtements et permet d'utiliser le système à des ampérages plus élevés et, par conséquent, d'améliorer le débit. L'emploi d'un obturateur diélectrique aux orifices facilite l'entretien et le remplacement de ces derniers.

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