Gas laser system

Details Gas laser system Gas laser system

H - Electricity

01

S

345/39

H01S 3/10 (2006.01) H01S 3/098 (2006.01) H01S 3/223 (2006.01)

Patent

CA 1080839

TITLE GAS LASER SYSTEM INVENTORS Klaus J. Siemsen John Reid ABSTRACT OF THE DISCLOSURE A gas laser system which provides sequence lines of emission inaddition to the regular lines. The system includes a discharge cavity having a discharge tube and a hot gas absorber cell. The lasing gas and the gas in absorber are identical and may be either CO2, N2O or isotopes of this gas. The absorber cell is approximately 1/5 to 1/3 the length of the discharge cavity with the interior temperature of the absorber cell being greater than 200°C and the pressure within the cell being in the order of 20 torr.

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