Gas phase process for the production of...

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C - Chemistry, Metallurgy

07

C

260/658.2

C07C 17/08 (2006.01) C07C 17/087 (2006.01) C07C 17/21 (2006.01) C07C 19/08 (2006.01)

Patent

CA 2013675

GAS PHASE PROCESS FOR THE PRODUCTION OF 1,1-DICHLORO-1-FLUOROETHANE AND/OR 1-CHLORO-1,1-DIFLUOROETHANE FROM VINYLIDENE CHLORIDE Abstract of the Disclosure A novel gas phase process for the production of 1,1-dichloro-1-fluoroethane from vinylidene chloride and hydrogen fluoride is provided. The process is charac- terized by high conversion of vinylidene chloride to product, with a high selectivity for 1,1-dichloro-1-fluoro- ethane. The process may also be operated to selectively form 1-chloro-1,1-difluoroethane. Few volatile by-products and substantially no tar or oligomeric material is formed. Catalyst performance remains constant over extended periods of time.

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