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G01L 21/00 (2006.01) G01L 9/00 (2006.01) G01L 21/30 (2006.01) G01L 21/32 (2006.01)
Patent
CA 1279204
ABSTRACT Regarding a gas pressure gage for measuring a gas pressure in a vacuum chamber of a semiconductor element manufacturing apparatus, or the like, the present invention has made it possible to attain a small-sized and unitary gas pressure gage and to implement a thorough measurement of gas pressure from the atmospheric pressure to a high vacuum of about 10-10 Torr, by mounting both a mechanical vibrator type pressure gage and an ionization type pressure gage on a flange provided for fitting a chamber and by providing a control circuit for making the former gage operate in a low-vacuum region and the latter in a high-vacuum region.
532290
Borden Ladner Gervais Llp
Seiko Instruments Inc.
Vacuum Products Co.
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