C - Chemistry – Metallurgy – 10 – G
Patent
C - Chemistry, Metallurgy
10
G
23/346, 260/236.
C10G 27/06 (2006.01) B01D 53/14 (2006.01)
Patent
CA 1140924
Abstract of the Disclosure Compounds having the general formula: Image (I) where A is a C1-C4 straight or branched chain alkylene radical, B is a -SO3M, -CO2M, -PO3M2 grouping, M is hydrogen, or a cation giving a water-soluble derivative, R is hydrogen, a cation giving a water-soluble derivative, or a C1-C4 straight or branched alkyl, R1 is hydrogen, methyl or -COOH, and m is 0 or 1 and processes of preparing them. The compounds of the formula I can be used in a process for removing hydrogen sulphide from gases or liquid hydrocarbons.
332127
Phillips Emyr
Randell Donald R.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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