Gas purification system

Details Gas purification system Gas purification system

C - Chemistry, Metallurgy

10

K

165/3, 48/46

C10K 1/12 (2006.01)

Patent

CA 1169658

ABSTRACT OF THE DISCLOSURE A gas purification system including a first treatment apparatus, which purifies an untreated feed gas, containing toxic components, such as HCN gas, H2S gas and NH3 gas, to yield a primary treated gas in which the feed gas apparatus contacts an alkaline absorbent liquid; an absorbent-liquid-regeneration apparatus in which the absorbent liquid, after absorbing the toxic components is regenerated by bubbling regeneration gas; its conventional and a second treatment apparatus in which the primary treated gas is further purified in yield a secondary treated gas by stripping any residual NH3 gas. The regeneration gas and the toxic-component-absorbed absorbent liquid are forcibly converged by premix nozzles into combined gas/liquid jets which are injected into the absorbent-liquid-regeneration apparatus. The primary treated gas and the gas coming from the regeneration apparatus as its effluent waste are mixed and the resultant mixed gas is then fed into and treated within the second treatment apparatus.

376099

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