Gas supplying apparatus

G - Physics – 05 – D

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G05D 7/00 (2006.01) B01J 4/00 (2006.01) C03B 37/014 (2006.01) C03C 17/02 (2006.01) C23C 16/448 (2006.01)

Patent

CA 1237047

- 1 - Abstract: The invention provides a gas supply apparatus or supplying the gaseous raw material of an article to a processing apparatus. The apparatus includes at least one main vessel for storing liquid raw material of the article and for supplying the gaseous raw material to the processing apparatus, an auxiliary vessel for storing liquid raw material for replenishment of the liquid raw material in the main vessel, a main pipe for delivering the liquid raw material from the auxiliary vessel to the main vessel, a return pipe connected to the main pipe, first and second control valves, and a feed device for feeding, through the main pipe, the liquid raw material replenishment to the main vessel. The liquid raw material remaining in the main pipe after the replenishment of the main vessel has taken place is returned to the auxiliary vessel through the return pipe, thereby avoiding any uncertainty in the quantity of raw material fed to the main vessel.

469057

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