Gas-treating device and method for treating gas

B - Operations – Transporting – 01 – D

Patent

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165/48

B01D 47/10 (2006.01)

Patent

CA 1269612

ABSTRACT OF THE DISCLOSURE In a gas treating device liquid is pressurized in a liquid chamber and is fed from this chamber into ejectors which open directly into venturi fittings which are surrounded by a gas chamber. Gas enters through an inlet into this gas chamber. A gas-liquid mixture enters from the venturi fittings into a tank, where the gas is separated from the liquid. Liquid from the tank is fed through a pump into the liquid chamber. Gas escapes from the tank into a discharge line comprising a de-mister.

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