Genetic markers for schizophrenia and bipolar disorder

C - Chemistry – Metallurgy – 12 – Q

Patent

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C12Q 1/68 (2006.01)

Patent

CA 2709479

The invention provides haplotypes and SNPs of the HPCAL1 and SV2C genes which predict the risk for developing schizophrenia or bipolar disorder and predict which patients are likely to respond to a given treatment or are more likely to ex-perience negative side effects.

La présente invention concerne des marqueurs génétiques de la schizophrénie (SZ) et/ou des troubles bipolaires (BD) et des procédés d'utilisation de ceux-ci.

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