Getter system for purifying the work atmosphere in the...

C - Chemistry – Metallurgy – 23 – C

Patent

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C23C 14/56 (2006.01) F04B 37/02 (2006.01) H01J 7/18 (2006.01) H01J 37/18 (2006.01)

Patent

CA 2254515

A system is disclosed formed of one or more getter devices in form of sintered bodies of getter powders or deposits of getter material onto a metal support, to be arranged in the work area of process chambers for the deposition of thin layers of metallic or ceramic materials from vapors or plasmas for purifying the gaseous atmosphere contained in that area.

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