C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/175, 204/96.
C23C 16/50 (2006.01) B09C 1/02 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01)
Patent
CA 1269950
ABSTRACT OF THE DISCLOSURE A glow-discharge decomposition apparatus comprising a pair of ground electrodes each suitable for carrying a substrate. An RF-electrode has two portions forming its opposite sides and connected to a RF-power supply, a matching circuit and a controlling circuit having at least one electric element. Each of the two substrates carried by the pair of electrodes is placed over one of the RF-electrode sides in parallel to each other; the RF-electrode sides being in parallel and being electrically insulated from each other. The matching circuit is connected to accept RF-power from the RF- power supply and to divide the RF-power into two, the controlling circuit being connected to accept RF-power from the matching circuit; and the outputs of the controlling circuit being connected to supply RF-powers to the RF-electrode sides. The films are fabricated on the substrates by supplying RF-powers which are independently controlled via the controlling circuit, whereby plasmas are controlled over each of the RF- electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.
484632
Ikuchi Nozomu
Nakayama Takehisa
Tai Masahiko
Tawada Yoshihisa
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
Osler Hoskin & Harcourt Llp
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