Glow discharge deposition apparatus having confined plasma...

Details Glow discharge deposition apparatus having confined plasma... Glow discharge deposition apparatus having confined plasma...

H - Electricity

01

L

356/182, 356/187

H01L 21/363 (2006.01) C23C 16/517 (2006.01) C23C 16/54 (2006.01) H01J 37/32 (2006.01)

Patent

CA 1243426

ABSTRACT Apparatus for confining an ionized plasma developed during glow discharge deposition of thin film semiconductor alloy materials to a preselected plasma region to deposit homogeneous semiconductor alloy material and to prevent etching of deposited semiconductor material. The apparatus includes elongated plates disposed opposite the ends of a cathode contained in a deposition chamber. The plates are negatively biased during the deposition process to repel electrons in and thereby confine the plasma.

504279

Affiliated with

Also associated with

Rating

Glow discharge deposition apparatus having confined plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Glow discharge deposition apparatus having confined plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Glow discharge deposition apparatus having confined plasma... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1261559