Glow discharge deposition apparatus including a non-...

H - Electricity – 01 – L

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H01L 21/02 (2006.01) C23C 16/505 (2006.01) H01J 37/32 (2006.01) H01L 21/00 (2006.01)

Patent

CA 1191975

Abstract of the Disclosure An improved glow discharge deposition appara- tus for depositing amorphous layers upon at least one substrate, the apparatus including a housing capable of withstanding vacuum pressures, a sub- strate upon which the amorphous layers are depos- ited, an r.f. powered cathode adapted to cooperate with the substrate for producing a plasma region in the housing, layer-producing materials adapted to be introduced into the plasma region, and heat- ing elements for warming the substrate to a deposition-effecting temperature. The improvement is provided by an electrically insulated base adapted to support the cathode in a non- horizontal, preferably a vertical, plane and a prop adapted to support the substrate in a plane adjacent and parallel to the non-horizontal plane in which the cathode is supported. The non- horizontal cathode is adapted for use either in a single deposition chamber for depositing a single amorphous layer onto the substrate or in a machine having a plurality of successive deposition cham- bers for depositing successive amorphous layers onto the substrate. In either embodiment, oppo- site planar faces of the cathode may be employed in combination with a pair of substrates, deposed in planes parallel to the plane of the cathode faces, to develop two plasma regions for simulta- neously depositing amorphous layer-producing mate- rial on each of the substrates. The substrate can be formed either of discrete plates or of a con- tinuous web of material. In the embodiment wherein the substrate is formed of discrete plates, a rotatable arm, associated with each deposition chamber, is adapted to cyclically introduce the substrate into the deposition cham- ber and expel the substrate from the deposition chamber.

424160

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