Glow discharge-generated chemical vapor deposition

B - Operations – Transporting – 05 – D

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B05D 7/24 (2006.01) C23C 16/40 (2006.01) C23C 16/505 (2006.01)

Patent

CA 2537075

A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode (16) and a counterelectrode (24). A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrate (28) to deposit a coating onto the substrate as an optically clear coating or to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clear powder-free or virtually powder free coating.

L'invention concerne un procédé de création de dépôt polymérisé par plasma sur un substrat au moyen d'une décharge luminescente. La décharge luminescente est créée entre une électrode et une contre-électrode. Un mélange d'un gaz porteur et de tétraalkylorthosilicate est circulé dans la décharge luminescente sur un substrat aux fins de dépôt d'un revêtement sur le substrat sous la forme d'un revêtement optiquement clair ou aux fins de création d'une modification de surface. Le procédé, mis en oeuvre, de préférence, à une pression atmosphérique ou presque atmosphérique, peut être conçu pour créer un revêtement optiquement clair exempt de poudre ou virtuellement exempt de poudre.

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