C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
167/232, 167/250
C07F 9/10 (2006.01) A61K 9/107 (2006.01) A61K 9/127 (2006.01) C07C 43/13 (2006.01) C07C 43/164 (2006.01) C07D 317/12 (2006.01) C07F 9/58 (2006.01) C07F 9/59 (2006.01)
Patent
CA 1264162
ABSTRACT Compounds of the general formula Image I wherein two of the residues R1, R2 and R3 represent C10-30-alkyl residues with at least 8 C-atoms in a straight chain, at least one of these residues being substituted by at least 2 C1-3-alkyl residues and the sum of the C-atoms in the two residues being greater than 20; and the third residue is a residue -P(O)(O-)OR4 in which R4 represents a lower-alkyl or C5-7-cycloalkyl residue which is substituted by a quaternary ammonium group or a C5-7-cycloalkyl residue which contains a di-(lower-alkyl)-substi- tuted nitrogen atom, are useful for the manufacture of colloidal solution systems. The compounds of formula I can be prepared starting from glycerol derivatives as described in more detail in the specification.
475022
Breuninger Manfred
Schmidt Dieter
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited/hoffmann-La Roche Limitee
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