Grating-based evanescent field molecular sensor using a thin...

G - Physics – 01 – N

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G01N 21/77 (2006.01) G01N 21/55 (2006.01) G01N 33/53 (2006.01)

Patent

CA 2744092

A technique for high sensitivity evanescent field molecular sensing employs a detection scheme that simultaneously couples a polarized beam to a single mode of a waveguide, and couples the polarized beam out of the waveguide to specularly reflect the beam by the same grating. Strong interation with the single (preferably TM) mode is provided by using a silicon on insulator (SOI) wafer having a waveguide thickness chosen between 10-400 nm so that the majority of the mode field strength spans the evanescent field. Well known, robust techniques for producing a grating on the waveguide are provided. Interrogation from a backside of the SOI wafer is taught.

La présente invention concerne une technique de détection moléculaire en champ évanescent de sensibilité élevée reposant sur un schéma de détection qui couple un faisceau polarisé à un mode unique d'un guide d'ondes, et qui couple le faisceau polarisé sortant du guide dondes pour réfléchir spéculairement le faisceau par le même réseau. Une interaction forte avec le mode unique (de préférence TM) est obtenue en utilisant une tranche de silicium sur isolant (SOI) ayant une épaisseur de guide d'ondes comprise entre 10 et 400 nm pour que la majorité de l'intensité de champ du mode recouvre le champ évanescent. L'invention concerne également des techniques robustes et bien connues de fabrication d'un réseau sur un guide d'ondes, et d'interrogation depuis la face arrière dune tranche SOI.

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