C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/502.5
C07F 9/54 (2006.01) C07F 9/70 (2006.01) C07F 9/74 (2006.01) C07F 9/90 (2006.01) C07F 9/92 (2006.01)
Patent
CA 1183156
NOVEL GROUP VA SALTS AND PROCESS FOR PREPARING SAME Abstract Of The Disclosure There are provided novel salts defined by the following Formula I: Image wherein R1, R2, R3, R4 and R5 are either alike or dif- ferent members selected from the group consisting of hy- drogen, alkyl radicals having from about one to about 24 carbon atoms, preferably from about one to about 10 carbon atoms; aryl radicals having from about six to about 20 carbon atoms, preferably from about six to about 10 carbon atoms; alkenyl radicals having from about two to about 30 carbons atoms, preferably from about two to about 20 car- bon atoms; cycloalkyl radicals having from about three to about 40 carbon atoms, preferably from about three to about 30 carbon atoms; aralkyl and alkaryl radicals having from about six to about 40 carbon atoms, preferably from about six to about 30 carbon atoms; a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, preferably chlorine; a hydroxyl group; an alkoxy or aryloxy group; a hydrocarbyl group, such as defined above, carrying halogen, hydroxyl, alkoxy or aryloxy, and a sulfonato group (-SO3-) or an alkyl, aryl, alkenyl, cycloalkyl, aralkyl or alkaryl group carrying a sulfonato group; provided that at least one of R1, R2 and is a sulfonato group or an alkyl I aryl, alkenyl, cyclo- alkyl, aralkyl or alkaryl, as defined above, carrying a sulfonato group; M is sulfur or oxygen, preferably oxygen; F is phosphorus, arsenic or antimony, preferably phosphor- us; and X is a halogen radical selected from the group consisting of fluorine, chlorine, bromine and iodine, pre- ferably chlorine and bromine, a tosyl group (a toluene sulfonato group), or an acetate group. The process for preparing these salts comprises reacting a ligand defined by the following formula: Image with an alpha-substituted ketone or aldehyde or an alpha- substituted thioketone or thioaldehyde defined by the following formula: Image wherein R1, R2, R3, R4, R5, F, M and X are as defined above.
386857
Beach David L.
Harrison James J.
Gulf Research & Development Company
Mccarthy Tetrault Llp
LandOfFree
Group va salts and process for preparing same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Group va salts and process for preparing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Group va salts and process for preparing same will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1319978