Growth of gan on sapphire with mse grown buffer layer

C - Chemistry – Metallurgy – 30 – B

Patent

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148/2.4, 148/3.8

C30B 29/38 (2006.01) C30B 23/02 (2006.01) C30B 25/06 (2006.01) C30B 25/18 (2006.01) C30B 30/04 (2006.01)

Patent

CA 2284475

A method of fabricating a gallium nitride or like epilayer on sapphire is disclosed wherein a buffer layer is grown on the sapphire substrate by magnetron sputter epitaxy (MSE); and then the gallium nitride epilayer is formed on the buffer layer, preferably by molecular beam epitaxy.

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