C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
148/2.4, 148/3.8
C30B 29/38 (2006.01) C30B 23/02 (2006.01) C30B 25/06 (2006.01) C30B 25/18 (2006.01) C30B 30/04 (2006.01)
Patent
CA 2284475
A method of fabricating a gallium nitride or like epilayer on sapphire is disclosed wherein a buffer layer is grown on the sapphire substrate by magnetron sputter epitaxy (MSE); and then the gallium nitride epilayer is formed on the buffer layer, preferably by molecular beam epitaxy.
Tang Haipeng
Webb James Brian
Marks & Clerk
National Research Council Of Canada
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