C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
148/2.55
C30B 19/00 (2006.01) C30B 19/04 (2006.01) C30B 19/06 (2006.01) C30B 19/08 (2006.01)
Patent
CA 1140032
ABSTRACT Semiconductor compounds which are alloys of group III-V compounds are grown by a liquid phase epitaxy method which in- cludes heating growth apparatus in a reducing atmosphere whilst maintaining a solvent for the compound, a source of the group III-V compound and another element of the alloy separate from each other. After heating to reduce oxides, the element is added to the solvent, the source is brought into contact with the solvent and the resulting solution is brought into contact with a substrate to effect growth of the compound. Apparatus for carrying out the method is also described.
322780
Faktor Marc M.
Haigh John
Moss Rodney H.
Post Office (the)
Ridout & Maybee Llp
LandOfFree
Growth of semiconductor compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Growth of semiconductor compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Growth of semiconductor compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-994097