C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/302, 260/279
C07D 277/38 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1138446
ABSTRACT The invention provides compounds of formula (I):- Image (I) and pharmaceutically acceptable acid addition salts thereof, which are useful as histamine H2-antagonilsts. In formula (I) Z is sulphur or methylene and A is a covalent bond or methylene or ethane-1,2-diyl optionally substituted with one C1-4 alkyl group and a second C1-4 alkyl group or a phenyl C1-4 alkyl group. A particular compound of formula (I) is 2-[2-(2- guanidino-4-thiazolyl methylthio)ethylamino-]-3-nitro- 1,4,5,6-tetrahydropyridine.
363090
Roantree Michael L.
Young Rodney C.
Gowling Lafleur Henderson Llp
Smith Kline & French Laboratories Limited
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