C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/289, 260/319
C07D 215/32 (2006.01) C07D 209/08 (2006.01) C07D 209/32 (2006.01) C07D 311/16 (2006.01) C07D 311/30 (2006.01)
Patent
CA 1180716
ABSTRACT OF THE DISCLOSURE A compound having the formula: Image wherein R1 represents an indanyl, indolyl, quinolyl or chromonyl group, the group of the formula Image (in which R2 represents a halogen atom or a nitro group), or the group of the formula Image (in which R3 represents a halogen atom, or an alkyl, nitro, cyano, acetamino, aminosulfonyl, benzoyl, phenoxy or trifluoromethyl group, R4 represents a hydrogen or halogen atom, or an alkyl group, and R5 represents a hydrogen or halogen atom, or an alkyl group), or a pharmaceutically acceptable salt thereof. The compound is obtained by reacting 4-guanidinomethyl- cyclohexanecarboxylic acid or a reactive derivative thereof with a compound of the formula R1-OH wherein R1 is the same as defined above, or a reactive derivative thereof. The compound and salt exhibit strong inhibitory effects on serine proteases and also antiallergic effects.
394507
Kikawa Yoshio
Kondo Kaname
Muramatsu Mutsumi
Satoh Toshio
Sekine Hiroyasu
Gowling Lafleur Henderson Llp
Nippon Chemiphar Co. Ltd.
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