C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/228, 260/355
C07D 313/00 (2006.01) C07D 315/00 (2006.01) C07H 17/08 (2006.01) C07H 19/01 (2006.01)
Patent
CA 1235694
ABSTRACT Antimicrobial of improved activity and solubility of the general formula (I): Image ...(I) wherein X1 represents Image X2 represents Image X3 represents Image R1 represents H or CH3; R2 and R3, which may be the same or different, each represent H or a lower alkyl group; for R4, R5 and R6, R4 is a lower alkyl group, R5 and R6 are either one ether bond, or else R4 is H, R5 is H, and R6 is OH; R7 represents H or a lower alkyl group; or an acid salt thereof.
492822
Beppu Teruhiko
Nakamura Teruya
Obayashi Akira
Takesako Kazutoh
Ridout & Maybee Llp
Takara Bio Inc.
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