H - Electricity – 01 – J
Patent
H - Electricity
01
J
277/12, 356/192
H01J 37/18 (2006.01) G03F 7/20 (2006.01) H01J 37/301 (2006.01)
Patent
CA 1294066
ABSTRACT OF THE DISCLOSURE Disclosed is a guard ring (20) in a particle beam lithography system (10) of a pressurized gas surrounding a seal apparatus (14) and concentric therewith so that the guard ring (20) of gas is located between the seal apparatus (14) and ambient pressure in which the remainder of the workpiece (12) is located and forms a curtain of gas surrounding the seal apparatus (14) to reduce contamination of the seal apparatus (14) and beam column (16). In one embodiment, the guard ring (20) is formed by a ring of small ports (60) connected to a source of pressurized gas so that gas at a pressure higher than the ambient-pressure is directed toward the workpiece (12). In a second embodiment, the guard ring (20) is formed by a small width groove (72) connected by gas ports (60) to a source of pressurized gas (64) by which gas is introduced into the groove (72). In a third embodiment, the guard ring (20) is formed by a plurality of gas ports (60) and counterbores (74) connected to a source of pressurized gas (64) by which gas is introduced into said counterbores (74). Both the groove (72) and the counterbores (74) serve to distribute the emitted pressurized gas. The emitted pressurized gas may be filtered dry air or gas, or an inert or an ionized gas, all of which may be preheated.
578323
Howard Glen E.
Young Lydia J.
Etec Systems Inc.
Osler Hoskin & Harcourt Llp
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