C - Chemistry – Metallurgy – 07 – J
Patent
C - Chemistry, Metallurgy
07
J
C07J 63/00 (2006.01) A61K 31/665 (2006.01)
Patent
CA 2062652
ABSTRACT OF THE DISCLOSURE Presented are a glycyrrhetic acid derivative of the following formula Image [wherein R is a hydrogen atom or an unsubstituted or substituted alkyl group of 1 to 18 carbon atoms] or a pharmacologically acceptable salt thereof, which has antioxidant, antiinflammatory and/or antiallergic activlty, a process for producing said compound or salt, and an antioxidant, antiinflammatory and/or antiallergic composition comprising said compound or salt. 24
Matsuda Reiko
Ogata Kazumi
Yamamoto Kyouzo
Kirby Eades Gale Baker
Senju Pharmaceutical Co. Ltd.
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