Hall-effect sensor

H - Electricity – 01 – L

Patent

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Details

H01L 43/06 (2006.01) G01R 33/07 (2006.01)

Patent

CA 2421077

The invention concerns a Hall-effect sensor consisting of a multilayer structure comprising a thin semiconductor material layer deposited on a semiconductor substrate (12), the two layers being electrically insulated with an insulation. The invention is characterised in that the substrate (12) is a n+-type semiconductor material whereon is deposited an insulating material consisting of a p- type semiconductor layer (13), and the thin active layer (14) is of the n- type doped in exhaustion mode. Preferably, the active layer consists of a silicon carbide or a gallium nitride layer.

La présente invention concerne un capteur à effet Hall constitué par une structure multicouche comprenant une couche mince d'un matériau semi-conducteur déposée sur un substrat (12) semi-conducteur, les deux couches étant isolées électriquement par un isolant, caractérisé en ce que le substrat (12) est un matériau semi- conducteur de type n+ sur lequel est déposé un matériau d'isolation constitué par une couche semi-conductrice de p-, et en ce que la couche mince active (14) est de type n- dopé en régime d'exhaustion. De préférence, la couche active est constituée par une couche de carbure de silicium ou de nitrure de gallium.

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