C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/370.4
C07D 303/22 (2006.01)
Patent
CA 1240688
Abstract of the Disclosure This invention relates to a halogen-substituted glycidyl ether compound represented by the following general formula (1): Image (1) wherein R1 means a hydrogen atom or methyl group, R2 denotes an alkylene group represented by the general formula -(--CH2--)-m, m standing for an integer of 4 - 20, or a xylylene group, and X is a halogen atom, as well as to a process for preparing the glycidyl ether compound by reacting in an aprotic polar solvent and in the presence of a strong basic substance a hydroxyl-substituted compound, represented by the following general formula (2): Image (2) wherein R1 has the same meaning as defined above, with a dihalogen-substituted compound represented by the following general formula (3): X-R2-X (3) wherein R2 and X have the same meanings as defined above. These compounds are distinguishable from known compounds by having an alkylene group, and these compounds can be used as intermediates when introducing such functional groups into amide compounds, amines and hydroxylsubstituted compounds as, for example, raw materials for adhesives, coatings and photo- sensitive resins.
472881
Itoh Hiroshi
Kamio Hideo
Nitta Atsuhiko
Tanaka Tomio
Tsuboi Kenji
Mitsui Toatsu Chemicals Inc.
Sim & Mcburney
LandOfFree
Halogen-substituted glycidyl ether compound and preparation... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Halogen-substituted glycidyl ether compound and preparation..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halogen-substituted glycidyl ether compound and preparation... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1210411