C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/325, 260/291
C07D 207/16 (2006.01) C07C 57/52 (2006.01) C07D 211/60 (2006.01)
Patent
CA 1124723
Abstract Compounds which have the general formula (I) Image wherein R is hydrogen, lower alkanoyl or Image m is 1 or 2; n is 0 or 1; R1 is hydrogen or lower alkyl: R2 and R'2 each is hydrogen or halogen; R3 is hydrogen, lower alkyl or CF3, and also halogen when n is 1: R4 is hydrogen, lower alkyl or trifluoromethyl: R6 is hydrogen, and also halogen when m is 1; at least one of R2, R'2, R3, R4 and R6 being halogen or CF3 as represented by the symbols and only R2 and R'2 can both be halogen at the same time, and basic salts thereof are useful as hypotensive agents.
321233
Ondetti Miguel A.
Sprague Peter W.
Osler Hoskin & Harcourt Llp
Squibb (e.r.) & Sons Inc.
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