Hard film and method of manufacturing the same

Details Hard film and method of manufacturing the same Hard film and method of manufacturing the same

C - Chemistry, Metallurgy

23

C

C23C 4/10 (2006.01)

Patent

CA 2592187

Disclosed are a hard film and a method useful for manufacturing the hard film wherein the hard film is obviously excellent in wear resistance, and exhibits excellent oxidation resistance even under a condition where hot heat generation tends to occur due to friction heating, consequently exhibits excellent properties compared with a usual hard-film including TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN, or NbCrAlSiBN. The hard film includes (M)a Cr b Al c Si d B e Y f Z (however, M is at least one element selected from a group 4A element, a group 5A element, and a group 6A element (except for Cr) in the periodic table, and Z shows one of N, CN, NO and CNO), wherein a+b+c+d+e+f=1, and 0<a!<=50.3, 0.05<=b<=0.4, 0.4<=c<=0.8, 0<=d<=0.2, 0<=e<=0.2, and 0.01<=f<=0.1, (a, b, c, d, e and f show atomic ratios of M, Cr, Al, Si, B and Y respectively).

La divulgation porte sur un film dur et une méthode utile pour sa fabrication là où le film dur est évidemment excellent quant à sa résistance à l'usure, et démontre une excellente résistance à l'oxydation, même sous des conditions où un débit calorifique critique tend à se produire en raison de l'échauffement dû à la friction, par conséquent, démontre d'excellentes propriétés en comparaison avec le film dur habituel, y compris TiAlN, TiCrAlN, TiCrAlSiBN, CrAlSiBN ou NbCrAlSiBN. Le film dur comprend (M)a CR b Al c Si d B e Y f Z (cependant, M est au moins un élément choisi parmi un élément du groupe 4A, un élément du groupe 5A, et un élément du groupe 6A (sauf pour le Cr) dans le tableau périodique, et Z représente l'un des (N, CN, NO et CNO), où a+b+c+d+e+f = 1, et 0 <a!. ltoreq.50.3, 0.05<=b. ltoreqØ4, 0.4<=c<=0.8, 0<=d<=0.2, 0<=e<=0.2 et 0.01<=f<=0.1, (a, b, c, d, e et f montrent des rapports atomiques de M, Cr, Al, Si, B et Y respectivement).

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