C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/30, 204/72
C25D 3/12 (2006.01) C25D 3/56 (2006.01)
Patent
CA 1118710
PC-5779 Abstract of the Disclosure An article prepared from a hard nickel electro- deposit is characterized by improved resistance to embrittle- ment when exposed to temperatures above about 200°C. Electrodeposits affording improved resistance to embrittle- ment contain 0.0071-1% sulfur and 0.02-5% manganese. The amount of manganese in the electrodeposits is correlated to the amount of sulfur present so that the manganese is present in an amount in excess of the stoichiometric amount required to form manganese sulfide. The electro- deposits which are also characterized by usefully low levels of internal stress are prepared using conventional nickel plating baths modified by the addition of sources of manganese ions and sulfur.
279084
Inco Limited
Smart & Biggar
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