Hard-surface cleaning compositions

C - Chemistry – Metallurgy – 11 – D

Patent

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Details

C11D 1/835 (2006.01) C11D 3/37 (2006.01) C11D 3/48 (2006.01) C11D 1/62 (2006.01) C11D 1/72 (2006.01)

Patent

CA 2280877

The invention provides a hard surface cleaning composition of pH 3-11 comprising: a) 1-30 % nonionic surfactant, b) 0.005-5 % of a water soluble, anionic polymer having an average molecular weight of less than 1000000, said polymer being free of quaternary nitrogen groups, wherein, the ratio of polymer: nonionic is 0.1: 1 or less, and, c) 0.005-5 % of a cationic surfactant. It is believed that in the presence of the cationic surfactant, negatively charged (i.e. carboxylic dissociated) polymer can interact with the cationic surfactant and the nonionic surfactant to form a three-component complex which deposit the nonionic surfactant upon the soil and/or surface being cleaned. While the mechanism is not entirely clear, this may possibly be due to the interaction of the charged polymer with mixed miscelles of cationic and nonionic surfactant.

L'invention concerne une composition de nettoyage de surfaces dures, à pH 3-11, comprenant: a) 1-30 % de tensio-actif non ionique, b) 0,005-5 % d'un polymère anionique hydrosoluble présentant un poids moléculaire moyen inférieur à 1000000, ledit polymère étant exempt de groupes quaternaires d'azote, le rapport de polymère:non ionique étant 0,1:1 ou inférieur et c) 0,005-5 % d'un tensio-actif cationique. On suppose qu'en présence du tensioactif cationique, un polymère chargé négativement (à savoir, carboxylique dissocié) peut interagir avec le tensio-actif cationique et le tensio-actif non ionique pour former un complexe à trois composants qui dépose le tensioactif non ionique sur la salissure et/ou surface en cours de nettoyage. Même si le mécanisme n'est pas complètement élucidé, l'effet peut être dû à l'interaction du polymère chargé avec des micelles de tensio-actif cationique et non ionique.

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