Hard, transparent amorphous hydrogenated boron nitride films...

Details Hard, transparent amorphous hydrogenated boron nitride films... Hard, transparent amorphous hydrogenated boron nitride films...

C - Chemistry, Metallurgy

23

C

C23C 4/10 (2006.01) C23C 14/14 (2006.01) C23C 16/34 (2006.01)

Patent

CA 2151650

This invention is directed to a process for providing a hard, transparent, hydrophobic film of hydrogenated boron nitride on a substrate and the film so made. The process comprises depositing the film condensation from a flux of ions generated from gaseous precursors comprising borazine, the kinetic energy of the ions being between 50 and 300 electron volts per ion. Preferably the process is plasma-enhanced chemical vapor deposition carried out in a radio frequency plasma system.

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