Heat-resistant film and production process thereof

B - Operations – Transporting – 29 – C

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B29C 55/12 (2006.01) C08J 5/18 (2006.01) C08L 65/00 (2006.01) C08L 71/00 (2006.01) C08L 81/02 (2006.01)

Patent

CA 1317430

- 37 - ABSTRACT OF THE DISCLOSURE Disclosed herein is a heat-resistant film obtained by biaxially-stretching a composition which comprises (A) 50-90 parts by weight of a polyether- etherketone having predominant recurring units of the formula: Image and (B) 50-10 parts by weight of a substantially linear poly(arylene sulfide) having melt viscosity of at least 1,000 poises. A production process of such a heat- resistant film is also disclosed, which comprises biaxially stretching the above composition in a temperature range at least equal to the crystallization temperature (Tc) of the poly(arylene sulfide) but not higher than the crystallization temperature (Tc) of the

585761

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