C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/251, 260/277
C07D 213/04 (2006.01) A01N 43/40 (2006.01) A01N 43/48 (2006.01) A01N 43/54 (2006.01) A01N 43/58 (2006.01) A01N 43/60 (2006.01) C07D 213/30 (2006.01) C07D 213/50 (2006.01) C07D 213/89 (2006.01) C07D 401/06 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01)
Patent
CA 2035978
Abstract of the Disclosure: Hetarylalkenes of the general formula I Image I where Ar is hetaryl, A is C1-C6-alkyl, C2-C6-alkenyl, C3-C8-cycloalkyl, C3-C8- cycloalkyl-C1-C3-alkyl or unsubstituted or monosubstitu- ted, disubstituted or trisubstituted aryl or aralkyl, Z is Image , Image , Image , Image or Image where R is hydrogen, C2-C4-acyl, unsubstituted or substituted benzoyl, C1-C4-alkylsulfonyl, unsubstituted or C1-C4-alkyl- substituted phenylsulfonyl or a radical R1, R1 is C1-C4-alkyl or unsubstituted or substituted phenyl or benzyl and Hal is fluorine, chlorine, bromine or iodine, and B is unsubstituted or substituted mononuclear or dinuclear aryl, aralkyl or hetaryl, and their N-oxides and addition salts, the preparation of these substances, intermediates for this purpose and the preparation thereof, fungicides containing hetarylalkenes and a corresponding method for controlling harmful fungi.
Ammermann Eberhard
Goetz Norbert
Lauer Manfred
Lorenz Gisela
Zierke Thomas
Basf Aktiengesellschaft
Robic
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